Vacuum Atmosphere Furnace

Product Introduction
The Vacuum Atmosphere Furnace, also known as an oxygen-free annealing furnace, integrates advanced thermal processing technology with vacuum systems. This innovative equipment enables all conventional heat treatment processes while significantly enhancing treatment quality and material densification during sintering operations.

Ideal for diverse experimental and production requirements, the furnace supports tailored atmosphere control based on material characteristics:

• Oxygen atmosphere for transparent ferroelectric ceramics
• Hydrogen atmosphere for transparent alumina ceramics
• Nitrogen atmosphere for nitride ceramics (e.g., aluminum nitride)
• Precision annealing and crystallization for glass materials
• High-temperature sintering for electronic and structural ceramics
• Rapid heating quenching processes for metal components
• Specialized operation: Hydrogen atmosphere for molybdenum wire furnaces, vacuum-protected operation for tungsten wire furnaces

Key Features

1. Dual-Shell Safety Design
   • Double-layer furnace housing with integrated air-cooling system
   • Rapid heating/cooling capability with low surface temperature (<50°C)
   • Compliant with national safety standards
2. Advanced Insulation System
   • Imported polycrystalline alumina fiber lining
   • Superior energy efficiency and thermal retention
   • Extended service life
3. Atmosphere Control Versatility
   • Compatible with argon, hydrogen, and other inert gases
   • Pre-vacuum pumping capability
   • Multi-gas protection system
4. Smart Control Interface
   • USB/RS-485 connectivity for computer integration
   • Multi-device management and remote diagnostics
   • Automatic temperature calibration
5. Digital Operation Platform
   • Touchscreen control with data logging
   • Remote monitoring and historical data storage
   • Real-time parameter adjustment
6. Customizable Chamber Options
   • Quartz tube (up to 1000°C)
   • Alumina/corundum tube (high-temperature models)
   • Various dimensional configurations available

Applications

• Electronics manufacturing
• Research institutions
• Industrial enterprises
• Academic institutions
• Advanced material processing
• Aerospace component production

Technical Notes

• Temperature range: RT – 1700°C (model dependent)
• Vacuum level: <10Pa (standard configuration)
• Control precision: ±1°C (at set point)
• Power supply: 220V/380V, 50/60Hz (customizable)
• PID intelligent control with self-tuning function