Desktop Vacuum Atmosphere Furnace

Desktop Vacuum Atmosphere Furnace

Product Overview
The Desktop Vacuum Atmosphere Furnace, also known as an oxygen-free annealing furnace, integrates advanced vacuum technology with precision thermal processing capabilities. This compact laboratory-scale system enables a full range of vacuum heat treatment processes, enhancing sintering efficiency while significantly improving material quality and densification.

Ideal for research and small-batch production, the furnace supports customized atmosphere control based on material requirements:

Oxygen atmosphere for transparent ferroelectric ceramics
Hydrogen atmosphere for transparent alumina ceramics
Nitrogen atmosphere for nitride ceramics (e.g., aluminum nitride)
Precision annealing and crystallization for glass materials
High-temperature sintering for electronic/structural ceramics
Rapid heating quenching processes for metal components
Specialized operation: Hydrogen protection for molybdenum wire systems, vacuum-protected operation for tungsten wire systems

Key Features

Compact Safety Design
- Dual-shell construction with integrated air-cooling system
- Rapid thermal cycling capability (RT to max temp in <30 mins)
- Low-temperature surface operation (<45°C at exterior)
- Compliant with CE/UL safety standards
Advanced Insulation System
- Imported polycrystalline alumina fiber lining (1400°C rated)
- 30% greater energy efficiency vs conventional designs
- Extended service life (>10,000 cycles)
Multi-Atmosphere Capability
- Compatible with argon, hydrogen, nitrogen, and forming gas
- Pre-vacuum pumping to <10Pa
- Dual-gas mixing system with flow control
Smart Connectivity
- USB/RS-485 interfaces for PC integration
- Multi-unit network control capability
- Remote diagnostics and temperature calibration
Intuitive Operation
- 7-inch color touchscreen with gesture control
- Real-time data logging (CSV format)
- Cloud-based historical archive access
- Automatic process recipe storage (500+ programs)
Modular Chamber Options
- Quartz tube (1000°C standard)
- High-purity alumina tube (1400°C option)
- Customizable dimensions (ID 50-300mm)

Applications

Academic research institutions
Electronic material development
Advanced ceramic prototyping
Jewelry/dental alloy processing
Semiconductor component testing
Aerospace material qualification

Technical Specifications

Temperature Range: RT – 1400°C (standard) / 1700°C (optional)
Vacuum Level: 10⁻³ Pa (high vacuum option)
Control Precision: ±1°C @ set point
Heating Elements: Silicon carbide (SiC) rods
Power Supply: 220V single-phase / 380V three-phase
Dimensions: 600×500×700mm (desktop configuration)

Enhanced Capabilities

Integrated gas purification system
Over-temperature protection with dual sensors
Explosion-proof design for hydrogen operation
Mobile app control (iOS/Android)
Automatic pressure regulation